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dc.contributor.authorAhn Kwang-Duk-
dc.contributor.authorD.-I. Koo-
dc.contributor.authorH.-S. Cho-
dc.contributor.authorC.-M. Chung-
dc.date.accessioned2024-01-13T22:32:08Z-
dc.date.available2024-01-13T22:32:08Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/112158-
dc.languageEnglish-
dc.subject키워드-
dc.titlePhotoacid generating polymers from sulfonyloxymaleimides and application as dual tone resists.-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationProceedings of the Tenth International Conference on Photopolymrs-Principles, Processes, and Materia, pp.86 - 95-
dc.citation.titleProceedings of the Tenth International Conference on Photopolymrs-Principles, Processes, and Materia-
dc.citation.startPage86-
dc.citation.endPage95-
dc.citation.conferencePlaceUS-
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