DSpace at KIST: Performance characteristics of the PMS SAS-3600 wafer surface scanner.

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DC Field	Value	Language
dc.contributor.author	채승기	-
dc.contributor.author	Benjamin Y. H. Liu	-
dc.contributor.author	Bae Gwi-Nam	-
dc.contributor.author	MYONG HYON KOOK	-
dc.contributor.author	Chun-Sik Lee	-
dc.date.accessioned	2024-01-13T23:00:25Z	-
dc.date.available	2024-01-13T23:00:25Z	-
dc.date.created	2021-09-29	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/112320	-
dc.language	English	-
dc.subject	wafer surface scanner	-
dc.subject	light scattering	-
dc.subject	microcontamination	-
dc.subject	particles	-
dc.subject	silicon wafers	-
dc.title	Performance characteristics of the PMS SAS-3600 wafer surface scanner.	-
dc.type	Conference	-
dc.description.journalClass	1	-
dc.identifier.bibliographicCitation	Proceedings of the 39th annual technical meeting of the IES., v.v. 1, pp.336 - 344	-
dc.citation.title	Proceedings of the 39th annual technical meeting of the IES.	-
dc.citation.volume	v. 1	-
dc.citation.startPage	336	-
dc.citation.endPage	344	-
dc.citation.conferencePlace	US	-

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