Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Ha, Won-yong | - |
dc.contributor.author | Park, Eunsung | - |
dc.contributor.author | Yoon, Eom Do | - |
dc.contributor.author | Park, Hyo-Sung | - |
dc.contributor.author | Chong, Daniel | - |
dc.contributor.author | Tan, Shyue Seng | - |
dc.contributor.author | Tng, Michelle | - |
dc.contributor.author | Quek, Elgin | - |
dc.contributor.author | Bruschini, Claudio | - |
dc.contributor.author | Charbon, Edoardo | - |
dc.contributor.author | Choi, Woo-Young | - |
dc.contributor.author | Lee, Myung-Jae | - |
dc.date.accessioned | 2024-01-19T09:33:55Z | - |
dc.date.available | 2024-01-19T09:33:55Z | - |
dc.date.created | 2023-06-15 | - |
dc.date.issued | 2023-04 | - |
dc.identifier.issn | 1094-4087 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/113797 | - |
dc.description.abstract | This paper presents a single-photon avalanche diode (SPAD) in 55 nm bipolar-CMOSDMOS (BCD) technology. In order to realize a SPAD having sub-20 V breakdown voltage for mobile applications while preventing high tunneling noise, a high-voltage N-well available in BCD is utilized to implement the avalanche multiplication region. The resulting SPAD has a breakdown voltage of 18.4 V while achieving an excellent dark count rate of 4.4 cps/mu m2 at the excess bias voltage of 7 V in spite of the advanced technology node. At the same time, the device achieves a high peak photon detection probability (PDP) of 70.1% at 450 nm thanks to the high and uniform E-field. Its PDP values at 850 and 940 nm, wavelengths of interest for 3D ranging applications reach 7.2 and 3.1%, respectively, with the use of deep N-well. The timing jitter of the SPAD, full width at half maximum (FWHM), is 91 ps at 850 nm. It is expected that the presented SPAD enables cost-effective time-of-flight and LiDAR sensors with the advanced standard technology for many mobile applications. | - |
dc.language | English | - |
dc.publisher | Optical Society of America | - |
dc.title | Single-photon avalanche diode fabricated in standard 55 nm bipolar-CMOS-DMOS technology with sub-20 V breakdown voltage | - |
dc.type | Article | - |
dc.identifier.doi | 10.1364/OE.485424 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | Optics Express, v.31, no.9, pp.13798 - 13805 | - |
dc.citation.title | Optics Express | - |
dc.citation.volume | 31 | - |
dc.citation.number | 9 | - |
dc.citation.startPage | 13798 | - |
dc.citation.endPage | 13805 | - |
dc.description.isOpenAccess | Y | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000988193100001 | - |
dc.identifier.scopusid | 2-s2.0-85158060803 | - |
dc.relation.journalWebOfScienceCategory | Optics | - |
dc.relation.journalResearchArea | Optics | - |
dc.type.docType | Article | - |
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