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dc.contributor.authorNing, Ruiguang-
dc.contributor.authorJung, Soo Young-
dc.contributor.authorChoi, Haneul-
dc.contributor.authorLee, Byeong-hyeon-
dc.contributor.authorKim, Min-Seok-
dc.contributor.authorChoi, Hyung-Jin-
dc.contributor.authorLee, Jun Young-
dc.contributor.authorPark, Jin Soo-
dc.contributor.authorJung, Sung-Jin-
dc.contributor.authorJang, Ho Won-
dc.contributor.authorWon, Sung Ok-
dc.contributor.authorChang, Hye Jung-
dc.contributor.authorJang, Ji-Soo-
dc.contributor.authorLee, Kyu Hyoung-
dc.contributor.authorLee, Byung Chul-
dc.contributor.authorBaek, Seung-Hyub-
dc.date.accessioned2024-01-19T10:02:32Z-
dc.date.available2024-01-19T10:02:32Z-
dc.date.created2023-02-10-
dc.date.issued2023-03-
dc.identifier.issn1738-8090-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/113965-
dc.languageEnglish-
dc.publisher대한금속·재료학회-
dc.titleSelective Area Epitaxy of Complex Oxide Heterostructures on Si by Oxide Hard Mask Lift-Off (Nov ,10.1007/s13391-022-00386-0, 2022)-
dc.typeArticle-
dc.identifier.doi10.1007/s13391-022-00395-z-
dc.description.journalClass1-
dc.identifier.bibliographicCitationElectronic Materials Letters, v.19-
dc.citation.titleElectronic Materials Letters-
dc.citation.volume19-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.identifier.wosid000905907800001-
dc.identifier.scopusid2-s2.0-85145098746-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeCorrection; Early Access-
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KIST Article > 2023
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