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dc.contributor.authorYoon, Jongwon-
dc.contributor.authorBae, Ga-Young-
dc.contributor.authorYoo, Seonggwang-
dc.contributor.authorYoo, Jung Il-
dc.contributor.authorYou, Nam-Ho-
dc.contributor.authorHong, Woong-Ki-
dc.contributor.authorKo, Heung Cho-
dc.date.accessioned2024-01-19T18:02:11Z-
dc.date.available2024-01-19T18:02:11Z-
dc.date.created2022-01-25-
dc.date.issued2020-03-
dc.identifier.issn0925-8388-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/118881-
dc.description.abstractRecently, deep-ultraviolet (DUV) photodetectors with useful functions including transparency and flexibility have been developed for a real-time environmental monitoring, a wearable monitoring system, transparent wireless communication, and a smart window system. In this study, we investigate the DUV sensing characteristics of transparent and flexible IGZO thin-film transistors (TFTs) fabricated by a dry transfer printing, which is a very promising technique affording the device fabrication on unconventional surfaces. The fabricated TFT devices show high mechanical stability even at a bending radius of 1.4 mm, and the repeatable and gate bias-dependent DUV photoresponse characteristics. The gate bias-dependent photocurrent (I-ph) decay characteristics are likely attributed to the different surface re-adsorption rates of oxygen molecules depending on the gate bias polarity, which are qualitatively described based on energy band diagrams. In addition, the wavelength-dependent photoresponse characteristics of the IGZO TFT device upon UV illumination with lambda= 245 nm show a 10 times faster I-ph decay behavior than that upon UV illumination with lambda=365 nm. The result implies that the dissociative oxygen arising from the DUV illumination could accelerate the I-ph decay due to the increased surface adsorption. (C) 2019 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.titleDeep-ultraviolet sensing characteristics of transparent and flexible IGZO thin film transistors-
dc.typeArticle-
dc.identifier.doi10.1016/j.jallcom.2019.152788-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF ALLOYS AND COMPOUNDS, v.817-
dc.citation.titleJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.volume817-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000506166400030-
dc.identifier.scopusid2-s2.0-85074457893-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.type.docTypeArticle-
dc.subject.keywordPlusOXIDE-
dc.subject.keywordPlusDEVICE-
dc.subject.keywordAuthorIGZO thin film transistors-
dc.subject.keywordAuthorDeep-UV sensing-
dc.subject.keywordAuthorTransparent and flexible electronics-
dc.subject.keywordAuthorTransfer printing-
dc.subject.keywordAuthorSurface effects-
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