Reducing the Persistent Photoconductivity. Effect in Zinc Oxide by Sequential Surface Ultraviolet Ozone and Annealing Treatments
- Authors
- Park, Sungho; Cho, Nam-Kwang; Kim, Byung Jun; Jeong, Shin Young; Han, Il Ki; Kim, Youn Sang; Kang, Seong Jun
- Issue Date
- 2019-12
- Publisher
- AMER CHEMICAL SOC
- Citation
- ACS APPLIED ELECTRONIC MATERIALS, v.1, no.12, pp.2655 - 2663
- Abstract
- We developed " a method to reduce the persistent photoconductivity (PPC) effect of zinc oxide (ZnO) thin film transistors (TFTs) by sequential surface treatment, which includes preannealing/ultraviolet ozone/ postannealing (PUP) treatments. Preannealing treatment improves the surfacepostannealing uniformity of the film and eliminates the residual solvent and contaminant molecules without affecting the zinc oxygen bonds. The ultraviolet ozone (UVO) treatment reduces the oxygen vacancy and increases the amount of metal hydroxide groups on the surface of ZnO by converting adsorbed 02 on the ZnO and atmospheric oxygen to highly chemisorbed OH-. Postannealing treatment improves the film quality by making the film densely and inducing zinc oxygen bonding in the ZnO film. Therefore, the negative threshold voltage shift decreased upon visible light irradiation of the PUP ZnO TFT. The treatment also improved the photoresponsivity upon the irradiation with ultraviolet (UV) light. Moreover, the photoelectric recovery time after the irradiation of the UV light was shortened, which means that the PPC effect on the PUP ZnO TFT decreased. The decrease in the PPC effect originated from the reduced oxygen vacancies and the increased surface metal hydroxide groups upon PUP treatment. Our experiment results suggest a method to reduce the PPC effect on ZnO TFTs via PUP treatment, which is useful for developing high-performance UV phototransistors that are based on ZnO.
- Keywords
- THIN-FILM TRANSISTORS; RAY PHOTOELECTRON-SPECTROSCOPY; DOPED ZNO; WETTABILITY CONVERSION; BIAS INSTABILITY; TEMPERATURE; STABILITY; LIGHT; oxide semiconductor; solution process; UVO treatment; preannealing; oxygen vacancy; metal hydroxide; persistent photoconductivity effect
- ISSN
- 2637-6113
- URI
- https://pubs.kist.re.kr/handle/201004/119228
- DOI
- 10.1021/acsaelm.9b00623
- Appears in Collections:
- KIST Article > 2019
- Files in This Item:
There are no files associated with this item.
- Export
- RIS (EndNote)
- XLS (Excel)
- XML
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.