Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Fan, Shizhao | - |
dc.contributor.author | Jung, Daehwan | - |
dc.contributor.author | Sun, Yukun | - |
dc.contributor.author | Li, Brian D. | - |
dc.contributor.author | Martin-Martin, Diego | - |
dc.contributor.author | Lee, Minjoo L. | - |
dc.date.accessioned | 2024-01-19T20:04:10Z | - |
dc.date.available | 2024-01-19T20:04:10Z | - |
dc.date.created | 2021-09-02 | - |
dc.date.issued | 2019-05 | - |
dc.identifier.issn | 2156-3381 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/120073 | - |
dc.description.abstract | The highest efficiency heteroepitaxial GaAs solar cells on Si have historically been grown in the p(+)/n polarity, which was preferred due to the decreased sensitivity of open-circuit voltage in such cells to threading dislocations. The n(+)/p polarity also has potential advantages due to the higher mobility of electrons than holes in GaAs, and most multi-junction solar cells in the literature are grown in this polarity. Here, we demonstrate n(+)/p GaAs solar cells on Si with a certified AM1.5G efficiency of 16.8%, approaching the best certified efficiency of 18.1% for p(+)/n cells in the literature. The high efficiency of our n(+)/p cells is primarily due to the short-circuit current density of 26.5 mA/cm(2), which is significantly higher than prior p(+)/n record cells. The strong carrier collection results from the use of a highly transparent AIInP window layer, thin n(+) emitter, and a relatively high minority electron diffusion length in the p-type base. The high quantum efficiency of these n(+)/p cells at wavelengths of 700-880 nm makes them promising for future triple-junction devices on Si, where the GaAs will serve as a middle sub-cell. | - |
dc.language | English | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.subject | REDUCTION | - |
dc.subject | FILMS | - |
dc.title | 16.8%-Efficient n(+)/p GaAs Solar Cells on Si With High Short-Circuit Current Density | - |
dc.type | Article | - |
dc.identifier.doi | 10.1109/JPHOTOV.2019.2894657 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | IEEE JOURNAL OF PHOTOVOLTAICS, v.9, no.3, pp.660 - 665 | - |
dc.citation.title | IEEE JOURNAL OF PHOTOVOLTAICS | - |
dc.citation.volume | 9 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 660 | - |
dc.citation.endPage | 665 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000466042900011 | - |
dc.identifier.scopusid | 2-s2.0-85064883647 | - |
dc.relation.journalWebOfScienceCategory | Energy & Fuels | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Energy & Fuels | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | REDUCTION | - |
dc.subject.keywordPlus | FILMS | - |
dc.subject.keywordAuthor | III-V on silicon | - |
dc.subject.keywordAuthor | GaAs on Si | - |
dc.subject.keywordAuthor | molecular beam epitaxy (MBE) | - |
dc.subject.keywordAuthor | n(+)/p cells | - |
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