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dc.contributor.authorFan, Shizhao-
dc.contributor.authorJung, Daehwan-
dc.contributor.authorSun, Yukun-
dc.contributor.authorLi, Brian D.-
dc.contributor.authorMartin-Martin, Diego-
dc.contributor.authorLee, Minjoo L.-
dc.date.accessioned2024-01-19T20:04:10Z-
dc.date.available2024-01-19T20:04:10Z-
dc.date.created2021-09-02-
dc.date.issued2019-05-
dc.identifier.issn2156-3381-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/120073-
dc.description.abstractThe highest efficiency heteroepitaxial GaAs solar cells on Si have historically been grown in the p(+)/n polarity, which was preferred due to the decreased sensitivity of open-circuit voltage in such cells to threading dislocations. The n(+)/p polarity also has potential advantages due to the higher mobility of electrons than holes in GaAs, and most multi-junction solar cells in the literature are grown in this polarity. Here, we demonstrate n(+)/p GaAs solar cells on Si with a certified AM1.5G efficiency of 16.8%, approaching the best certified efficiency of 18.1% for p(+)/n cells in the literature. The high efficiency of our n(+)/p cells is primarily due to the short-circuit current density of 26.5 mA/cm(2), which is significantly higher than prior p(+)/n record cells. The strong carrier collection results from the use of a highly transparent AIInP window layer, thin n(+) emitter, and a relatively high minority electron diffusion length in the p-type base. The high quantum efficiency of these n(+)/p cells at wavelengths of 700-880 nm makes them promising for future triple-junction devices on Si, where the GaAs will serve as a middle sub-cell.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectREDUCTION-
dc.subjectFILMS-
dc.title16.8%-Efficient n(+)/p GaAs Solar Cells on Si With High Short-Circuit Current Density-
dc.typeArticle-
dc.identifier.doi10.1109/JPHOTOV.2019.2894657-
dc.description.journalClass1-
dc.identifier.bibliographicCitationIEEE JOURNAL OF PHOTOVOLTAICS, v.9, no.3, pp.660 - 665-
dc.citation.titleIEEE JOURNAL OF PHOTOVOLTAICS-
dc.citation.volume9-
dc.citation.number3-
dc.citation.startPage660-
dc.citation.endPage665-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000466042900011-
dc.identifier.scopusid2-s2.0-85064883647-
dc.relation.journalWebOfScienceCategoryEnergy & Fuels-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaEnergy & Fuels-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusREDUCTION-
dc.subject.keywordPlusFILMS-
dc.subject.keywordAuthorIII-V on silicon-
dc.subject.keywordAuthorGaAs on Si-
dc.subject.keywordAuthormolecular beam epitaxy (MBE)-
dc.subject.keywordAuthorn(+)/p cells-
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KIST Article > 2019
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