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dc.contributor.authorPark, Bong-Ok-
dc.contributor.authorLokhande, C. D.-
dc.contributor.authorPark, Hyung-Sang-
dc.contributor.authorJung, Kwang-Deog-
dc.contributor.authorJoo, Oh-Shim-
dc.date.accessioned2024-01-19T20:32:48Z-
dc.date.available2024-01-19T20:32:48Z-
dc.date.created2022-01-25-
dc.date.issued2019-03-
dc.identifier.issn0254-0584-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/120256-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.titleRETRACTION: Cathodic electrodeposition of RuO2 thin films from Ru(III)Cl3 solution (Retraction of Vol 87, Pg 59, 2004)-
dc.typeArticle-
dc.identifier.doi10.1016/j.matchemphys.2019.02.009-
dc.description.journalClass1-
dc.identifier.bibliographicCitationMATERIALS CHEMISTRY AND PHYSICS, v.226, pp.387 - 387-
dc.citation.titleMATERIALS CHEMISTRY AND PHYSICS-
dc.citation.volume226-
dc.citation.startPage387-
dc.citation.endPage387-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000460710500052-
dc.identifier.scopusid2-s2.0-85061456511-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalResearchAreaMaterials Science-
dc.type.docTypeRetraction-
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KIST Article > 2019
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