Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Yoo, Seolhee | - |
dc.contributor.author | Kim, Sangsig | - |
dc.contributor.author | Song, Yong-Won | - |
dc.date.accessioned | 2024-01-19T21:31:18Z | - |
dc.date.available | 2024-01-19T21:31:18Z | - |
dc.date.created | 2022-01-10 | - |
dc.date.issued | 2018-11-01 | - |
dc.identifier.issn | 1369-8001 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/120703 | - |
dc.description.abstract | Black phosphorus (BP) has distinctive properties of tunable direct band gap as a semiconductor material, and both high carrier mobility and on/off switching performance for electronic devices, but has a significant drawback of material degradation in ambient atmosphere. Also, unlike graphene or MoS2 , BP is only synthesized in bulk shapes limiting the fabrication of thin film-based devices. We demonstrated a contact printing process for BP field effect transistors (FET) with the steps of mechanical exfoliation of BP flakes and their randomized stamping in dry-transfer regime. The contact printing featured by fast, continuous and solvent-free process on the pre-patterned electrodes guarantees high process efficiency providing immunity against the chemical degradation of BP layers. With asymmetric I-V characteristics, the resultant BP-channelized FET shows the electrical properties of on/off current ratio, hole mobility, and subthreshold swing as > 10(2) , similar to 130 cm(2)/Vs, and similar to 4.6 V/dec, respectively. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCI LTD | - |
dc.subject | PHOTORESPONSE | - |
dc.title | Lithography-free fabrication of field effect transistor channels with randomly contact-printed black phosphorus flakes | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.mssp.2018.06.010 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.86, pp.58 - 62 | - |
dc.citation.title | MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | - |
dc.citation.volume | 86 | - |
dc.citation.startPage | 58 | - |
dc.citation.endPage | 62 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000439119400008 | - |
dc.identifier.scopusid | 2-s2.0-85048964030 | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | PHOTORESPONSE | - |
dc.subject.keywordAuthor | Black phosphorus | - |
dc.subject.keywordAuthor | Field effect transistor | - |
dc.subject.keywordAuthor | Contact printing | - |
dc.subject.keywordAuthor | Lithography-free | - |
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