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dc.contributor.authorNa, Dongsoo-
dc.contributor.authorPark, Kichul-
dc.contributor.authorPark, Ki-Hwan-
dc.contributor.authorSong, Yong-Won-
dc.date.accessioned2024-01-20T00:02:56Z-
dc.date.available2024-01-20T00:02:56Z-
dc.date.created2021-09-03-
dc.date.issued2017-11-24-
dc.identifier.issn0957-4484-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/122043-
dc.description.abstractBlack phosphorus (BP) has attracted increasing attention due to its unique electrical properties. In addition, the outstanding optical nonlinearity of BP has been demonstrated in various ways. Its functionality as a saturable absorber, in particular, has been validated in demonstrations of passive mode-locked lasers. However, normally, the performance of BP is degraded eventually by both thermal and chemical damage in ambient conditions. The passivation of BP is the critical issue to guarantee a stable performance of the optical devices. We quantitatively characterized the mode-locked lasers operated by BP saturable absorbers with diversified passivation materials such as polydimethylsiloxane (PDMS) or Al2O3, considering the atomic structure of the materials, and therefore the hydro-permeability of the passivation layers. Unlike the BP layers without passivation, we demonstrated that the Al2O3-passivated BP layer was protected from the surface oxidation reaction in the long-term, and the PDMS-passivated one had a short-term blocking effect. The quantitative analysis showed that the time-dependent characteristics of the pulsed laser without passivation were changed with respect to the pulse duration, spectral width, and time-bandwidth product displaying 550 fs, 2.8 nm, and 0.406, respectively. With passivation, the changes were limited to <43 fs, <0.3 nm, and <0.012, respectively.-
dc.languageEnglish-
dc.publisherIOP PUBLISHING LTD-
dc.subjectEVANESCENT FIELD INTERACTION-
dc.subjectATOMIC LAYER DEPOSITION-
dc.subjectCARBON NANOTUBE-
dc.subjectGRAPHENE-
dc.subjectTRANSISTORS-
dc.titlePassivation of black phosphorus saturable absorbers for reliable pulse formation of fiber lasers-
dc.typeArticle-
dc.identifier.doi10.1088/1361-6528/aa9429-
dc.description.journalClass1-
dc.identifier.bibliographicCitationNANOTECHNOLOGY, v.28, no.47-
dc.citation.titleNANOTECHNOLOGY-
dc.citation.volume28-
dc.citation.number47-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000414414800001-
dc.identifier.scopusid2-s2.0-85033669268-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusEVANESCENT FIELD INTERACTION-
dc.subject.keywordPlusATOMIC LAYER DEPOSITION-
dc.subject.keywordPlusCARBON NANOTUBE-
dc.subject.keywordPlusGRAPHENE-
dc.subject.keywordPlusTRANSISTORS-
dc.subject.keywordAuthorblack phosphorus-
dc.subject.keywordAuthorsaturable absorber-
dc.subject.keywordAuthorultrafast pulse laser-
dc.subject.keywordAuthorpolydimethylsiloxane passivation-
dc.subject.keywordAuthoralumina passivation-
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KIST Article > 2017
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