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dc.contributor.authorDash, Umasankar-
dc.contributor.authorAcharya, Susant Kumar-
dc.contributor.authorCho, Seong Won-
dc.contributor.authorLee, Suyoun-
dc.contributor.authorLee, Kyoungjun-
dc.contributor.authorChae, Seung Chul-
dc.contributor.authorCho, Myung Rae-
dc.contributor.authorJung, Chang Uk-
dc.date.accessioned2024-01-20T00:03:21Z-
dc.date.available2024-01-20T00:03:21Z-
dc.date.created2021-09-03-
dc.date.issued2017-11-15-
dc.identifier.issn0925-8388-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/122064-
dc.description.abstractIn this work, the magnetotransport properties of epitaxial Sr1-xLaxRu1-xFexO3 (x = 0.05, 0.10, 0.20, and 0.30) thin films grown by pulsed laser deposition on SrTiO3 (001) substrates were investigated. Compared to doping Fe into the Ru4+ site of SrRuO3, doping LaFeO3 into SrRuO3 resulted in an increase in the zero-field resistivity. A larger zero-field resistivity value in magnetic perovskite oxide is, in many cases, favorable for obtaining high magnetoresistance. The films (0.0 <= x <= 0.10) showed metallic behavior and ferromagnetic ordering, although the resistivity increased and the ferromagnetic transition temperature T-C decreased with an increase in x. The thin film with x = 0.20 displayed a clear metal-toinsulator phase transition at low temperature and also displayed a well-defined resistivity minimum. This upturn in the resistivity curve is associated with the large electron-electron interaction present in the material. The magnetoresistance values increased as x increased, and we observed a large negative magnetoresistance (MR = -35%) for the thin film with x = 0.30. The observed high MR values are associated with spin fluctuation of the mobile electronic carriers in the material. (C) 2017 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE SA-
dc.subjectFERROMAGNET SRRUO3-
dc.titleLarge magnetoresistance in LaFeO3-substituted SrRuO3 epitaxial thin films-
dc.typeArticle-
dc.identifier.doi10.1016/j.jallcom.2017.07.043-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF ALLOYS AND COMPOUNDS, v.724, pp.549 - 554-
dc.citation.titleJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.volume724-
dc.citation.startPage549-
dc.citation.endPage554-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000407848400068-
dc.identifier.scopusid2-s2.0-85022004388-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.type.docTypeArticle-
dc.subject.keywordPlusFERROMAGNET SRRUO3-
dc.subject.keywordAuthorSrRuO3-
dc.subject.keywordAuthorLaFeO3-
dc.subject.keywordAuthorOxide thin film-
dc.subject.keywordAuthorMagnetoresistance-
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KIST Article > 2017
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