Synthesis of a Photocurable Ladder-like Poly(phenyl-co-mercaptopropyl)silsesquioxane as Gate Dielectric Material

Authors
Lee, Albert S.Baek, Kyung-YoulHwang, Seung Sang
Issue Date
2013-09-01
Publisher
TAYLOR & FRANCIS LTD
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.580, no.1, pp.88 - 94
Abstract
A new photocurable ladder-like poly(phenyl-co-mercaptopropyl)silsesquioxane (LPPMPSQ) was synthesized in one pot via base catalyzed hydrolysis-polycondensation of a comonomer mixture of phenyltrimethoxysilane and 3-mercaptopropyltrimethoxysilane. Obtained LPPMPSQ was characterized by H-1 NMR, FT-IR, Si-29 NMR, TGA, and the electrical (k = 3.6) and mechanical properties (surface modulus = 4.9 GPa) found to be suitable for application as a photocurable gate dielectric material.
Keywords
dielectric constant; ladder-like; silsesquioxane; gate dielectric
ISSN
1542-1406
URI
https://pubs.kist.re.kr/handle/201004/127674
DOI
10.1080/15421406.2013.807720
Appears in Collections:
KIST Article > 2013
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