Role of Si as carrier suppressor in amorphous Zn-Sn-O

Authors
Kang, IlJoonPark, Chul HongChong, EugeneLee, Sang Yeol
Issue Date
2012-12
Publisher
ELSEVIER
Citation
CURRENT APPLIED PHYSICS, v.12, pp.S12 - S16
Abstract
Through the first-principles study, we investigated the microscopic properties of oxygen vacancy in the amorphous Zn2SnO4 (a-ZTO) and the amorphous Si-doped Zn2SnO4 (a-SZTO). The oxygen vacancy (V(O)) is found to play a role of shallow donor as sources of n-type conductivity in the both a-ZTO and a-SZTO. In both materials, V(O) is preferred to couple with Sn, and the coordination number (CN) of Sn is overall reduced by O-deficiency. However, an interesting finding is that in the presence of Si, the formation of V(O) can be significantly suppressed, and the formation enthalpy is calculated to be increased. The computational results suggest that Si atom can be an excellent carrier suppressor in a-ZTO. We also find that the effective mass of electron carrier is increased in the presence of Si. These results can be explained in the respect of the overall decrease of the oxygen coordination numbers of Sn atoms by the strain effect induced by Si. (c) 2012 Elsevier B.V. All rights reserved.
Keywords
OXIDE; OXIDE; Amorphous; Oxide semiconductor; O-Deficiency; ZnSnO; ZTO; Vacancy; Suppressor; Doping
ISSN
1567-1739
URI
https://pubs.kist.re.kr/handle/201004/128589
DOI
10.1016/j.cap.2012.05.044
Appears in Collections:
KIST Article > 2012
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