Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Cai, Gangri | - |
dc.contributor.author | Lim, Iseul | - |
dc.contributor.author | Lee, Deok Yeon | - |
dc.contributor.author | Shrestha, Nabeen K. | - |
dc.contributor.author | Lee, Joong Kee | - |
dc.contributor.author | Nah, Yoon-Chae | - |
dc.contributor.author | Lee, Wonjoo | - |
dc.contributor.author | Han, Sung-Hwan | - |
dc.date.accessioned | 2024-01-20T14:32:42Z | - |
dc.date.available | 2024-01-20T14:32:42Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2012-06-21 | - |
dc.identifier.issn | 1520-6106 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/129142 | - |
dc.description.abstract | Chemical bath deposition is an attractive technique to form single- and multilayered metal oxide/chalcogenide films on electrode surfaces. However, the occurrence of desorption and/or ion-exchange reaction during subsequent chemical bath deposition has so far limited preparation of multilayered metal oxide/chalcogenide films. In this paper, we report a method to prevent desorption and ion-exchange reaction of metal oxide/chalcogenide on electrode surfaces using a polyelectrolyte multilayer during sequential chemical bath deposition. By controlling the ion permeability of the polyelectrolyte multilayer, Cu2-xSe film was successfully deposited on the CdS film. The Cu2-xSe/CdS film is confirmed by UV-vis absorption spectroscopy, scanning electron microscopy, energy dispersive X-ray analysis, and X-ray powder diffractometer. Furthermore, the Cu2-xSe/CdS films were investigated as photoinduced charge transfer devices which showed photocurrents of 0.22 mA/cm(2) under illumination (I = 100 mW/cm(2)). | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.subject | METAL CHALCOGENIDE | - |
dc.title | Sequential Chemical Bath Deposition of Cu2-xSe/CdS Film by Suppressing Ion-Exchange Reaction | - |
dc.type | Article | - |
dc.identifier.doi | 10.1021/jp301617q | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF PHYSICAL CHEMISTRY B, v.116, no.24, pp.7176 - 7180 | - |
dc.citation.title | JOURNAL OF PHYSICAL CHEMISTRY B | - |
dc.citation.volume | 116 | - |
dc.citation.number | 24 | - |
dc.citation.startPage | 7176 | - |
dc.citation.endPage | 7180 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000305444200017 | - |
dc.identifier.scopusid | 2-s2.0-84862667074 | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Physical | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | METAL CHALCOGENIDE | - |
dc.subject.keywordAuthor | Chemical Bath Deposition | - |
dc.subject.keywordAuthor | CuSe/CdS fiolm | - |
dc.subject.keywordAuthor | Ion Exchanage | - |
dc.subject.keywordAuthor | Electrode | - |
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