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dc.contributor.authorCai, Gangri-
dc.contributor.authorLim, Iseul-
dc.contributor.authorLee, Deok Yeon-
dc.contributor.authorShrestha, Nabeen K.-
dc.contributor.authorLee, Joong Kee-
dc.contributor.authorNah, Yoon-Chae-
dc.contributor.authorLee, Wonjoo-
dc.contributor.authorHan, Sung-Hwan-
dc.date.accessioned2024-01-20T14:32:42Z-
dc.date.available2024-01-20T14:32:42Z-
dc.date.created2021-09-05-
dc.date.issued2012-06-21-
dc.identifier.issn1520-6106-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/129142-
dc.description.abstractChemical bath deposition is an attractive technique to form single- and multilayered metal oxide/chalcogenide films on electrode surfaces. However, the occurrence of desorption and/or ion-exchange reaction during subsequent chemical bath deposition has so far limited preparation of multilayered metal oxide/chalcogenide films. In this paper, we report a method to prevent desorption and ion-exchange reaction of metal oxide/chalcogenide on electrode surfaces using a polyelectrolyte multilayer during sequential chemical bath deposition. By controlling the ion permeability of the polyelectrolyte multilayer, Cu2-xSe film was successfully deposited on the CdS film. The Cu2-xSe/CdS film is confirmed by UV-vis absorption spectroscopy, scanning electron microscopy, energy dispersive X-ray analysis, and X-ray powder diffractometer. Furthermore, the Cu2-xSe/CdS films were investigated as photoinduced charge transfer devices which showed photocurrents of 0.22 mA/cm(2) under illumination (I = 100 mW/cm(2)).-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.subjectMETAL CHALCOGENIDE-
dc.titleSequential Chemical Bath Deposition of Cu2-xSe/CdS Film by Suppressing Ion-Exchange Reaction-
dc.typeArticle-
dc.identifier.doi10.1021/jp301617q-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF PHYSICAL CHEMISTRY B, v.116, no.24, pp.7176 - 7180-
dc.citation.titleJOURNAL OF PHYSICAL CHEMISTRY B-
dc.citation.volume116-
dc.citation.number24-
dc.citation.startPage7176-
dc.citation.endPage7180-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000305444200017-
dc.identifier.scopusid2-s2.0-84862667074-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalResearchAreaChemistry-
dc.type.docTypeArticle-
dc.subject.keywordPlusMETAL CHALCOGENIDE-
dc.subject.keywordAuthorChemical Bath Deposition-
dc.subject.keywordAuthorCuSe/CdS fiolm-
dc.subject.keywordAuthorIon Exchanage-
dc.subject.keywordAuthorElectrode-
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