Aggregation behavior of a polystyrene-b-poly(phenylsilsesquioxane) H-type copolymer at the air/water interface

Authors
Seo, YongsokYoum, Sang GilKim, Ji HunSeo, Youngwook P.Hong, Soon ManSohn, Dae WonTakahara, AtsushiChoi, Hyoung Jin
Issue Date
2012-05-09
Publisher
ELSEVIER SCI LTD
Citation
POLYMER, v.53, no.11, pp.2223 - 2232
Abstract
A comprehensive Langmuir film balance/atomic force microscope study of the surface aggregation behavior of an H-type block copolymer having four branches of polystyrene (PS) blocks (number average molar mass (M-n) = 5000 Da per each branch) and poly(phenylsilsesquioxane) (PPSQ) (M-n = 40,000 Da) has been performed. Temperature dependent surface pressure isotherms and hysteresis experiments were combined with molecules aggregation number per surface micelle, leading to a self-consistent picture of the surface morphology and aggregation phenomena. In spite of the ladder structure of the PPSQ segment, the micelles mostly exist as spherical aggregates because of strong interaction between PS blocks. (C) 2012 Elsevier Ltd. All rights reserved.
Keywords
METHACRYLATE) DIBLOCK COPOLYMERS; BLOCK POLYELECTROLYTE MICELLES; POLYION COMPLEX NANOMATERIALS; LINEAR POLYELECTROLYTES; MULTIPLE MORPHOLOGIES; SYNTHETIC-POLYMER; OPPOSITE CHARGE; MONOLAYERS; TEMPERATURE; FILMS; METHACRYLATE) DIBLOCK COPOLYMERS; BLOCK POLYELECTROLYTE MICELLES; POLYION COMPLEX NANOMATERIALS; LINEAR POLYELECTROLYTES; MULTIPLE MORPHOLOGIES; SYNTHETIC-POLYMER; OPPOSITE CHARGE; MONOLAYERS; TEMPERATURE; FILMS; H-block copolymer; Surface micelle aggregation; Pi-A behavior
ISSN
0032-3861
URI
https://pubs.kist.re.kr/handle/201004/129259
DOI
10.1016/j.polymer.2012.03.032
Appears in Collections:
KIST Article > 2012
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