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dc.contributor.authorKim, Kyung-Ho-
dc.contributor.authorKim, Hyung-jun-
dc.contributor.authorAhn, Jae-Pyung-
dc.contributor.authorLee, Seung-Cheol-
dc.contributor.authorWon, Sung Ok-
dc.contributor.authorChoi, Jun Woo-
dc.contributor.authorChang, Joonyeon-
dc.date.accessioned2024-01-20T15:35:04Z-
dc.date.available2024-01-20T15:35:04Z-
dc.date.created2021-09-05-
dc.date.issued2011-12-01-
dc.identifier.issn0021-8979-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/129725-
dc.description.abstractMicrostructure and the corresponding magnetic property of epitaxial MgO and subsequent Fe layers in situ grown on GaAs(001) substrates are investigated as a function of the epitaxial layer thicknesses. It is found that the MgO layers retain a 1.6 nm thick Mg-rich amorphous layer at the initial stage of the MgO growths regardless of its total thickness. Systematic x-ray diffraction analysis reveals that the MgO layers are under in-plane compressive strain which is partially relaxed as the total MgO thickness increases from 4 to 20 nm. The misfit strain within the MgO layers results in three-dimensional Fe islands forming at lower thickness with two different zone axis of [010] or [1 (1) over bar0]. Furthermore, the islands coalesce as the nominal thickness increases, resulting in serpentine-shaped Fe islands. Finally, it completely covers the underlying MgO layers, forming an epitaxial Fe layer at the nominal thickness higher than 10 nm. The three-dimensional Fe islands at the initial stage show superparamagnetism, which becomes ferromagnetic as the Fe forms a two-dimensional layer. (C) 2011 American Institute of Physics. [doi:10.1063/1.3665887]-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectPULSED-LASER DEPOSITION-
dc.subjectMOLECULAR-BEAM EPITAXY-
dc.subjectTHIN-FILMS-
dc.subjectFE/MGO-
dc.subjectHETEROSTRUCTURES-
dc.subjectGAAS(001)-
dc.subjectMGO(001)-
dc.subjectSI(001)-
dc.titleEpitaxial growth of Fe and MgO layers on GaAs (001): Microstructure and magnetic property-
dc.typeArticle-
dc.identifier.doi10.1063/1.3665887-
dc.description.journalClass1-
dc.identifier.bibliographicCitationJOURNAL OF APPLIED PHYSICS, v.110, no.11-
dc.citation.titleJOURNAL OF APPLIED PHYSICS-
dc.citation.volume110-
dc.citation.number11-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000298254800174-
dc.identifier.scopusid2-s2.0-84859311050-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusPULSED-LASER DEPOSITION-
dc.subject.keywordPlusMOLECULAR-BEAM EPITAXY-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordPlusFE/MGO-
dc.subject.keywordPlusHETEROSTRUCTURES-
dc.subject.keywordPlusGAAS(001)-
dc.subject.keywordPlusMGO(001)-
dc.subject.keywordPlusSI(001)-
dc.subject.keywordAuthorGaAs-
dc.subject.keywordAuthorMgO-
dc.subject.keywordAuthorFe-
dc.subject.keywordAuthorStrain-
dc.subject.keywordAuthorMicrostructure-
dc.subject.keywordAuthorMagnetics-
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