Full metadata record

DC Field Value Language
dc.contributor.authorKang, Min Gyu-
dc.contributor.authorCho, Kwang Hwan-
dc.contributor.authorOh, Seung Min-
dc.contributor.authorDo, Young Ho-
dc.contributor.authorKang, Chong Yun-
dc.contributor.authorKim, Sangsig-
dc.contributor.authorYoon, Seok Jin-
dc.date.accessioned2024-01-20T17:03:28Z-
dc.date.available2024-01-20T17:03:28Z-
dc.date.created2021-09-02-
dc.date.issued2011-05-
dc.identifier.issn1567-1739-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/130392-
dc.description.abstract(Ba,Sr)TiO3 (BST) thin film with a perovskite structure has a potential for the practical applications in various functional devices. Normally, the BST thin films derived from sol-gel and sputtering are amorphous or partially crystalline when processed below 700 degrees C. For the purpose of integrating BST thin film directly into system-on-package (SoP), it is necessary to process the BST film below 350 degrees C. The electrical properties of low-temperature crystallized BST film were studied in this paper. The BST thin films have been crystallized at 300 degrees C by excimer laser annealing (ELA). The BST films were exhibited in a single perovskite phase and have well-defined electrical properties such as high dielectric constant, low dielectric loss and low leakage current density. As a result, we demonstrated crystallized BST thin film which has permittivity of 143, dielectric loss of 0.028 and leakage current density of 0.9 mu A/cm(2) below 300 degrees C. (C) 2011 Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER-
dc.subjectSYSTEM-
dc.subjectRF-
dc.subjectPERFORMANCE-
dc.subjectCAPACITORS-
dc.subjectDEPENDENCE-
dc.subjectSOP-
dc.subjectDC-
dc.titleLow-temperature crystallization and electrical properties of BST thin films using excimer laser annealing-
dc.typeArticle-
dc.identifier.doi10.1016/j.cap.2010.12.029-
dc.description.journalClass1-
dc.identifier.bibliographicCitationCURRENT APPLIED PHYSICS, v.11, no.3, pp.S66 - S69-
dc.citation.titleCURRENT APPLIED PHYSICS-
dc.citation.volume11-
dc.citation.number3-
dc.citation.startPageS66-
dc.citation.endPageS69-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.identifier.wosid000296605000012-
dc.identifier.scopusid2-s2.0-80255132080-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle; Proceedings Paper-
dc.subject.keywordPlusSYSTEM-
dc.subject.keywordPlusRF-
dc.subject.keywordPlusPERFORMANCE-
dc.subject.keywordPlusCAPACITORS-
dc.subject.keywordPlusDEPENDENCE-
dc.subject.keywordPlusSOP-
dc.subject.keywordPlusDC-
dc.subject.keywordAuthorBST-
dc.subject.keywordAuthorThin film-
dc.subject.keywordAuthorExcimer laser annealing-
dc.subject.keywordAuthorEmbedded capacitor-
dc.subject.keywordAuthorSystem-on-package-
dc.subject.keywordAuthorSol-gel-
Appears in Collections:
KIST Article > 2011
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE