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dc.contributor.authorJung, Y. W.-
dc.contributor.authorGhong, T. H.-
dc.contributor.authorByun, J. S.-
dc.contributor.authorKim, Y. D.-
dc.contributor.authorKim, H. J.-
dc.contributor.authorChang, Y. C.-
dc.contributor.authorShin, S. H.-
dc.contributor.authorSong, J. D.-
dc.date.accessioned2024-01-20T21:05:34Z-
dc.date.available2024-01-20T21:05:34Z-
dc.date.created2021-09-03-
dc.date.issued2009-06-08-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/132398-
dc.description.abstractWe present pseudodielectric function data <<epsilon >>=<<epsilon(1)>>+i <<epsilon(2)>> from 0.7 to 5.0 eV of oxide-free AlSb that are the closest representation to date of the intrinsic bulk dielectric response epsilon of the material. Measurements were done on a 1.5 mu m thick film grown on (001) GaAs by molecular beam epitaxy. Data were obtained with the film in situ to avoid oxidation artifacts. Overlapping critical-point (CP) structures in the E-2 energy region were identified by means of band-structure calculations done with the linear augmented Slater-type orbital method. Calculated CP energies agree well with those obtained from data, confirming the validity of the calculations.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectSPECTROSCOPIC ELLIPSOMETRY-
dc.subjectCOMPOUND SEMICONDUCTORS-
dc.subjectANTIMONIDE-
dc.subjectALAS-
dc.titleDielectric response of AlSb from 0.7 to 5.0 eV determined by in situ ellipsometry-
dc.typeArticle-
dc.identifier.doi10.1063/1.3153127-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.94, no.23-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume94-
dc.citation.number23-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000266977100042-
dc.identifier.scopusid2-s2.0-67649099559-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusSPECTROSCOPIC ELLIPSOMETRY-
dc.subject.keywordPlusCOMPOUND SEMICONDUCTORS-
dc.subject.keywordPlusANTIMONIDE-
dc.subject.keywordPlusALAS-
dc.subject.keywordAuthoraluminium compounds-
dc.subject.keywordAuthorcritical points-
dc.subject.keywordAuthordielectric function-
dc.subject.keywordAuthorellipsometry-
dc.subject.keywordAuthorIII-V semiconductors-
dc.subject.keywordAuthormolecular beam epitaxial growth-
dc.subject.keywordAuthorsemiconductor thin films-
dc.subject.keywordAuthorSTO calculations-
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