Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Jung, Y. W. | - |
dc.contributor.author | Ghong, T. H. | - |
dc.contributor.author | Byun, J. S. | - |
dc.contributor.author | Kim, Y. D. | - |
dc.contributor.author | Kim, H. J. | - |
dc.contributor.author | Chang, Y. C. | - |
dc.contributor.author | Shin, S. H. | - |
dc.contributor.author | Song, J. D. | - |
dc.date.accessioned | 2024-01-20T21:05:34Z | - |
dc.date.available | 2024-01-20T21:05:34Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2009-06-08 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/132398 | - |
dc.description.abstract | We present pseudodielectric function data <<epsilon >>=<<epsilon(1)>>+i <<epsilon(2)>> from 0.7 to 5.0 eV of oxide-free AlSb that are the closest representation to date of the intrinsic bulk dielectric response epsilon of the material. Measurements were done on a 1.5 mu m thick film grown on (001) GaAs by molecular beam epitaxy. Data were obtained with the film in situ to avoid oxidation artifacts. Overlapping critical-point (CP) structures in the E-2 energy region were identified by means of band-structure calculations done with the linear augmented Slater-type orbital method. Calculated CP energies agree well with those obtained from data, confirming the validity of the calculations. | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | SPECTROSCOPIC ELLIPSOMETRY | - |
dc.subject | COMPOUND SEMICONDUCTORS | - |
dc.subject | ANTIMONIDE | - |
dc.subject | ALAS | - |
dc.title | Dielectric response of AlSb from 0.7 to 5.0 eV determined by in situ ellipsometry | - |
dc.type | Article | - |
dc.identifier.doi | 10.1063/1.3153127 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.94, no.23 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 94 | - |
dc.citation.number | 23 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000266977100042 | - |
dc.identifier.scopusid | 2-s2.0-67649099559 | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | SPECTROSCOPIC ELLIPSOMETRY | - |
dc.subject.keywordPlus | COMPOUND SEMICONDUCTORS | - |
dc.subject.keywordPlus | ANTIMONIDE | - |
dc.subject.keywordPlus | ALAS | - |
dc.subject.keywordAuthor | aluminium compounds | - |
dc.subject.keywordAuthor | critical points | - |
dc.subject.keywordAuthor | dielectric function | - |
dc.subject.keywordAuthor | ellipsometry | - |
dc.subject.keywordAuthor | III-V semiconductors | - |
dc.subject.keywordAuthor | molecular beam epitaxial growth | - |
dc.subject.keywordAuthor | semiconductor thin films | - |
dc.subject.keywordAuthor | STO calculations | - |
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