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dc.contributor.authorTark, S.J.-
dc.contributor.authorKang, M.G.-
dc.contributor.authorPark, S.-
dc.contributor.authorKim, Y.H.-
dc.contributor.authorKim, W.M.-
dc.contributor.authorKim, D.-
dc.date.accessioned2024-01-20T21:31:42Z-
dc.date.available2024-01-20T21:31:42Z-
dc.date.created2022-01-10-
dc.date.issued2009-05-
dc.identifier.issn1225-0562-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/132504-
dc.description.abstractIn this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.-
dc.languageKorean-
dc.subjectAl-doped zinc oxide-
dc.subjectAl-doped ZnO-
dc.subjectAZO films-
dc.subjectElectrical and optical properties-
dc.subjectHydrogenated-
dc.subjectLow temperatures-
dc.subjectMulti-step-
dc.subjectRf magnetron sputter-
dc.subjectrf-Magnetron sputtering-
dc.subjectTCO-
dc.subjectZnO : Al-
dc.subjectAluminum-
dc.subjectCarrier concentration-
dc.subjectCarrier mobility-
dc.subjectElectric properties-
dc.subjectFilm preparation-
dc.subjectHydrogenation-
dc.subjectLight transmission-
dc.subjectMagnetron sputtering-
dc.subjectMagnetrons-
dc.subjectOptical films-
dc.subjectOxide films-
dc.subjectSemiconducting zinc compounds-
dc.subjectSurface morphology-
dc.subjectTexturing-
dc.subjectZinc-
dc.subjectZinc oxide-
dc.subjectOptical properties-
dc.titleProperties of hydorogenated Al-doped ZnO films by multi-step texture-
dc.typeArticle-
dc.identifier.doi10.3740/MRSK.2009.19.5.259-
dc.description.journalClass1-
dc.identifier.bibliographicCitationKorean Journal of Materials Research, v.19, no.5, pp.259 - 264-
dc.citation.titleKorean Journal of Materials Research-
dc.citation.volume19-
dc.citation.number5-
dc.citation.startPage259-
dc.citation.endPage264-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.identifier.kciidART001343370-
dc.identifier.scopusid2-s2.0-68549110574-
dc.type.docTypeArticle-
dc.subject.keywordPlusAl-doped zinc oxide-
dc.subject.keywordPlusAl-doped ZnO-
dc.subject.keywordPlusAZO films-
dc.subject.keywordPlusElectrical and optical properties-
dc.subject.keywordPlusHydrogenated-
dc.subject.keywordPlusLow temperatures-
dc.subject.keywordPlusMulti-step-
dc.subject.keywordPlusRf magnetron sputter-
dc.subject.keywordPlusrf-Magnetron sputtering-
dc.subject.keywordPlusTCO-
dc.subject.keywordPlusZnO : Al-
dc.subject.keywordPlusAluminum-
dc.subject.keywordPlusCarrier concentration-
dc.subject.keywordPlusCarrier mobility-
dc.subject.keywordPlusElectric properties-
dc.subject.keywordPlusFilm preparation-
dc.subject.keywordPlusHydrogenation-
dc.subject.keywordPlusLight transmission-
dc.subject.keywordPlusMagnetron sputtering-
dc.subject.keywordPlusMagnetrons-
dc.subject.keywordPlusOptical films-
dc.subject.keywordPlusOxide films-
dc.subject.keywordPlusSemiconducting zinc compounds-
dc.subject.keywordPlusSurface morphology-
dc.subject.keywordPlusTexturing-
dc.subject.keywordPlusZinc-
dc.subject.keywordPlusZinc oxide-
dc.subject.keywordPlusOptical properties-
dc.subject.keywordAuthorHydrogenated-
dc.subject.keywordAuthorRf magnetron sputter-
dc.subject.keywordAuthorSurface textured-
dc.subject.keywordAuthorTCO-
dc.subject.keywordAuthorZnO : Al-
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