Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Lee, Suyoun | - |
dc.contributor.author | Jeong, Jeung-hyun | - |
dc.contributor.author | Wu, Zhe | - |
dc.contributor.author | Park, Young-Wook | - |
dc.contributor.author | Kim, Won Mok | - |
dc.contributor.author | Cheong, Byung-ki | - |
dc.date.accessioned | 2024-01-20T21:32:33Z | - |
dc.date.available | 2024-01-20T21:32:33Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2009-05 | - |
dc.identifier.issn | 0013-4651 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/132541 | - |
dc.description.abstract | For potential use in phase-change memory (PCM) devices, a Ge-doped SbTe (Ge-ST) was investigated with respect to both material properties and PCM device characteristics. Compared with Ge2Sb2Te5 (GST), the used Ge-ST (Ge5.3Sb77.7Te17) was characterized to have a lower melting temperature (814 K), a higher crystallization temperature (436 K), and a lower electrical resistivity in both amorphous and crystalline states. The Ge-ST devices have a much faster operation speed by about 1 order and consume less RESET power compared with the GST devices. Nevertheless, a higher RESET-programming current was required due to a lower dynamic resistance. Device reliability properties such as write/erase cycling endurance and data retention properties were also examined and found to be comparable to those of the GST devices, suggesting that the Ge-ST is a promising phase-change material for high speed PCMs. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3133252] All rights reserved. | - |
dc.language | English | - |
dc.publisher | ELECTROCHEMICAL SOC INC | - |
dc.subject | MECHANISM | - |
dc.subject | TE | - |
dc.title | Demonstration of a Reliable High Speed Phase-Change Memory Using Ge-Doped SbTe | - |
dc.type | Article | - |
dc.identifier.doi | 10.1149/1.3133252 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.156, no.7, pp.H612 - H615 | - |
dc.citation.title | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | - |
dc.citation.volume | 156 | - |
dc.citation.number | 7 | - |
dc.citation.startPage | H612 | - |
dc.citation.endPage | H615 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000267887500068 | - |
dc.identifier.scopusid | 2-s2.0-65949119314 | - |
dc.relation.journalWebOfScienceCategory | Electrochemistry | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Coatings & Films | - |
dc.relation.journalResearchArea | Electrochemistry | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | MECHANISM | - |
dc.subject.keywordPlus | TE | - |
dc.subject.keywordAuthor | Ge-doped SbTe | - |
dc.subject.keywordAuthor | High speed | - |
dc.subject.keywordAuthor | Non-volatile memory | - |
dc.subject.keywordAuthor | Phase Change Memory | - |
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