Effects of thermal annealing and Si incorporation on bonding structure and fracture properties of diamond-like carbon films

Authors
Choi, Heon WoongGage, David A.Dauskardt, Reinhold H.Lee, Kwang-RycolOh, Kyu Hwan
Issue Date
2009-04
Publisher
ELSEVIER SCIENCE SA
Citation
DIAMOND AND RELATED MATERIALS, v.18, no.4, pp.615 - 619
Abstract
The effects of thermal annealing and Si incorporation on the structure and properties of diamond-like carbon (DLC) films were investigated. As-deposited DLC film (DLC) and Si incorporated DLC film (Si-DLC), both with and without thermal annealing, were analyzed for bonding structure, residual stress, film thickness, elastic modulus and fracture properties using Raman spectroscopy, wafer curvature, nanoindentation, four-point bend fracture testing, and X-ray photoelectron spectroscopy (XPS). Raman spectroscopy clearly showed that thermal annealing of DLC films promotes more sp(2) bonding character, whereas Si incorporation into the films promotes more sp(3) bonding character. Interfacial fracture energies, film hardness and elastic modulus, and residual film stress were all found to vary strongly with the degree of sp(3) bonding in the DLC film. These changes in mechanical properties are rationalized in terms of the degree of three dimensional inter-links within the atomic bond network. (C) 2008 Elsevier B.V. All rights reserved.
Keywords
MECHANICAL-PROPERTIES; THIN-FILMS; ADHESION; SILICON; BEHAVIOR; DLC; COATINGS; CRACKING; MECHANICAL-PROPERTIES; THIN-FILMS; ADHESION; SILICON; BEHAVIOR; DLC; COATINGS; CRACKING; Diamond-like carbon (DLC); Four-point bending test; Fracture energy; Mechanical property
ISSN
0925-9635
URI
https://pubs.kist.re.kr/handle/201004/132636
DOI
10.1016/j.diamond.2008.10.051
Appears in Collections:
KIST Article > 2009
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