Effect of blocking layer by chemically induced surface barrier formation on xerographic properties
- Authors
- Seo, Young Ik; Kim, Dae-Gun; Do Kim, Young; Lee, Bum Jin; Lee, Kyu Hwan
- Issue Date
- 2008-10
- Publisher
- PERGAMON-ELSEVIER SCIENCE LTD
- Citation
- SCRIPTA MATERIALIA, v.59, no.8, pp.889 - 892
- Abstract
- In organic photoconductors, an anodic oxide layer acts as a barrier that prevents charge leakage to the substrate. A great challenge is forming a barrier that will enhance the xerographic properties of organic photoconductors. Here we report on a method for forming a surface barrier that simply involves immersion in extremely dilute alkaline solution and flattening in boiling water. The barrier demonstrates greatly enhanced wettability and xerographic properties of dark decay, sensitivity and residual voltage of the organic photoconductor. (c) 2008 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
- Keywords
- ALUMINUM; FABRICATION; NANOWIRES; MEMBRANES; MATRIX; ARRAYS; FILMS; LONG; ALUMINUM; FABRICATION; NANOWIRES; MEMBRANES; MATRIX; ARRAYS; FILMS; LONG; organic photoconductor; anodic failure; surface barrier; wettability; xerographic property
- ISSN
- 1359-6462
- URI
- https://pubs.kist.re.kr/handle/201004/133120
- DOI
- 10.1016/j.scriptamat.2008.06.049
- Appears in Collections:
- KIST Article > 2008
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