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dc.contributor.authorLee, Jong-Han-
dc.contributor.authorChoi, In-Hoon-
dc.contributor.authorShin, Sangwon-
dc.contributor.authorLee, Sunggoo-
dc.contributor.authorLee, J.-
dc.contributor.authorWhang, Chungnam-
dc.contributor.authorLee, Seung-Cheol-
dc.contributor.authorLee, Kwang-Ryeol-
dc.contributor.authorBaek, Jong-Hyeob-
dc.contributor.authorChae, Keun Hwa-
dc.contributor.authorSong, Jonghan-
dc.date.accessioned2024-01-21T01:34:38Z-
dc.date.available2024-01-21T01:34:38Z-
dc.date.created2021-09-05-
dc.date.issued2007-01-15-
dc.identifier.issn0003-6951-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/134734-
dc.description.abstract1 MeV Cu2+ ion was implanted into GaN with a dose of 1x10(17) cm(-2) at room temperature. After implantation, the samples were subsequently performed by rapid thermal annealing at 700, 800, and 900 degrees C for 5 min. Both nonmagnetic Cu ion implanted samples annealed at 700 and 800 degrees C exhibit the ferromagnetism at room temperature, and the saturation magnetization of these samples is estimated to be 0.057 mu(B) and 0.27 mu(B) per Cu atom from M-H curve, respectively. However, the sample annealed at 900 degrees C does not show ferromagnetism due to clustering of Cu during the annealing process. (c) 2007 American Institute of Physics.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectTHIN-FILMS-
dc.titleRoom-temperature ferromagnetism of cu-implanted GaN-
dc.typeArticle-
dc.identifier.doi10.1063/1.2431765-
dc.description.journalClass1-
dc.identifier.bibliographicCitationAPPLIED PHYSICS LETTERS, v.90, no.3-
dc.citation.titleAPPLIED PHYSICS LETTERS-
dc.citation.volume90-
dc.citation.number3-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000243582400052-
dc.identifier.scopusid2-s2.0-33846433488-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusTHIN-FILMS-
dc.subject.keywordAuthorion implantation-
dc.subject.keywordAuthormagnetism-
dc.subject.keywordAuthorCu implantation-
dc.subject.keywordAuthordiluted magnetic semiconductor-
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KIST Article > 2007
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