Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Lee, Jong-Han | - |
dc.contributor.author | Choi, In-Hoon | - |
dc.contributor.author | Shin, Sangwon | - |
dc.contributor.author | Lee, Sunggoo | - |
dc.contributor.author | Lee, J. | - |
dc.contributor.author | Whang, Chungnam | - |
dc.contributor.author | Lee, Seung-Cheol | - |
dc.contributor.author | Lee, Kwang-Ryeol | - |
dc.contributor.author | Baek, Jong-Hyeob | - |
dc.contributor.author | Chae, Keun Hwa | - |
dc.contributor.author | Song, Jonghan | - |
dc.date.accessioned | 2024-01-21T01:34:38Z | - |
dc.date.available | 2024-01-21T01:34:38Z | - |
dc.date.created | 2021-09-05 | - |
dc.date.issued | 2007-01-15 | - |
dc.identifier.issn | 0003-6951 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/134734 | - |
dc.description.abstract | 1 MeV Cu2+ ion was implanted into GaN with a dose of 1x10(17) cm(-2) at room temperature. After implantation, the samples were subsequently performed by rapid thermal annealing at 700, 800, and 900 degrees C for 5 min. Both nonmagnetic Cu ion implanted samples annealed at 700 and 800 degrees C exhibit the ferromagnetism at room temperature, and the saturation magnetization of these samples is estimated to be 0.057 mu(B) and 0.27 mu(B) per Cu atom from M-H curve, respectively. However, the sample annealed at 900 degrees C does not show ferromagnetism due to clustering of Cu during the annealing process. (c) 2007 American Institute of Physics. | - |
dc.language | English | - |
dc.publisher | AMER INST PHYSICS | - |
dc.subject | THIN-FILMS | - |
dc.title | Room-temperature ferromagnetism of cu-implanted GaN | - |
dc.type | Article | - |
dc.identifier.doi | 10.1063/1.2431765 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | APPLIED PHYSICS LETTERS, v.90, no.3 | - |
dc.citation.title | APPLIED PHYSICS LETTERS | - |
dc.citation.volume | 90 | - |
dc.citation.number | 3 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000243582400052 | - |
dc.identifier.scopusid | 2-s2.0-33846433488 | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordAuthor | ion implantation | - |
dc.subject.keywordAuthor | magnetism | - |
dc.subject.keywordAuthor | Cu implantation | - |
dc.subject.keywordAuthor | diluted magnetic semiconductor | - |
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