Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Park, JY | - |
dc.contributor.author | Kim, KT | - |
dc.contributor.author | Shin, HJ | - |
dc.contributor.author | Moon, S | - |
dc.contributor.author | Pak, JJ | - |
dc.date.accessioned | 2024-01-21T05:36:32Z | - |
dc.date.available | 2024-01-21T05:36:32Z | - |
dc.date.created | 2021-09-03 | - |
dc.date.issued | 2005-02 | - |
dc.identifier.issn | 0946-7076 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/136793 | - |
dc.description.abstract | This paper describes polidimethylsiloxane(PDMS) based bonding for assembly of microstructure device, an UV lithography applications for fabricating a 3-dimensional (3D) feed-horn-shaped structure mold array, and obtaining parallel light by using a mirror-reflected parallel-beam illuminator (MRPBI) system. A 3D feedhorn-shaped micro-electro-mechanical systems (MEMS) antenna has some attractive features for array applications, which can be used to improve microbolometer performance and to enhance the optical efficiency for thin film transistor-liquid crystal display (TFT-LCD) and other display devices but currently, MEMS technology has faced many difficulties in the fabrication of a 3D feed-horn-shaped MEMS antenna array itself. The purpose of this paper is to propose a new fabrication method to realize a 3D feed-horn-shaped MEMS antenna array by using a mirror-reflected parallel-beam illuminator (MRPBI) System with a very slowly rotated, inclined x-y-z stage. With a conventional UV lithography apparatus, it is very difficult to fabricate high-aspect-ratio structures (HARS) because a typical UV lithography apparatus cannot produce perfectly parallel light. From a theoretical analysis, a columnar illuminator over 6 In in height is required to achieve parallel light, but generally a laboratory height is not 6 m. Also, a novel method of lithography was tried to make a 3D structure array by exposing a planar wafer to the generated parallel light and rotating an inclined x-y-z stage at an ultra-slow rate. An optimization of the 3D structure array can be achieved by simulating a 3D feed-horn MEMS antenna. The feasibility of fabricating both a 3D feed horn MEMS antenna and assembly of detector with 3D feed-horn MEMS antenna was demonstrated. As a result, it seems possible to use a 3D feed-horn-shaped MEMS antenna to improve microbolometer performance and to fabricate several optical microstructure applications. | - |
dc.language | English | - |
dc.publisher | SPRINGER HEIDELBERG | - |
dc.title | 3D optical microstructure fabrication and its bonding to micro IR detector using elastomeric polymer | - |
dc.type | Article | - |
dc.identifier.doi | 10.1007/s00542-004-0482-4 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, v.11, no.2-3, pp.168 - 178 | - |
dc.citation.title | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | - |
dc.citation.volume | 11 | - |
dc.citation.number | 2-3 | - |
dc.citation.startPage | 168 | - |
dc.citation.endPage | 178 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.identifier.wosid | 000226664900014 | - |
dc.identifier.scopusid | 2-s2.0-24044479110 | - |
dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalResearchArea | Engineering | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.type.docType | Article | - |
dc.subject.keywordAuthor | mesh structure bonding | - |
dc.subject.keywordAuthor | PDMS | - |
dc.subject.keywordAuthor | infrared detector | - |
dc.subject.keywordAuthor | UV-lithography | - |
dc.subject.keywordAuthor | microstructure | - |
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