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dc.contributor.authorKim, DY-
dc.contributor.authorKim, JS-
dc.contributor.authorPark, BH-
dc.contributor.authorLee, JK-
dc.contributor.authorMaeng, SY-
dc.contributor.authorYoon, SJ-
dc.date.accessioned2024-01-21T06:04:23Z-
dc.date.available2024-01-21T06:04:23Z-
dc.date.created2021-09-02-
dc.date.issued2004-12-
dc.identifier.issn1058-4587-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/137022-
dc.description.abstractSrMoO4 thin films were fabricated on Si (100) surface from half-metallic Sr2FeMCoO6 target in oxygen atmosphere. Structural properties of SrMoO4/Si(100) thin films were investigated by x-ray diffraction and transmission electron microscopy. It was found that SrFeO3-delta nanoclusters were dispersed in the SrMoO4 matrix, showing obvious M-H hysteresis loops.-
dc.languageEnglish-
dc.publisherTAYLOR & FRANCIS LTD-
dc.subjectMAGNETORESISTANCE-
dc.titleDeposition of SrFeO3-delta-dispersed SrMoO4 oxide thin films on Si (100) surface for spintronic applications-
dc.typeArticle-
dc.identifier.doi10.1080/10584580490898380-
dc.description.journalClass1-
dc.identifier.bibliographicCitationINTEGRATED FERROELECTRICS, v.67, pp.25 - 30-
dc.citation.titleINTEGRATED FERROELECTRICS-
dc.citation.volume67-
dc.citation.startPage25-
dc.citation.endPage30-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000226089900004-
dc.identifier.scopusid2-s2.0-33751198969-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle; Proceedings Paper-
dc.subject.keywordPlusMAGNETORESISTANCE-
dc.subject.keywordAuthorSrFeO3-delta-
dc.subject.keywordAuthorSrMoO4-
dc.subject.keywordAuthorSr2FeMoO6-
dc.subject.keywordAuthornanoclusters-
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