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dc.contributor.authorLee, JS-
dc.contributor.authorHong, SH-
dc.contributor.authorWoo, KJ-
dc.contributor.authorLee, WI-
dc.date.accessioned2024-01-21T07:33:57Z-
dc.date.available2024-01-21T07:33:57Z-
dc.date.created2021-09-02-
dc.date.issued2004-03-
dc.identifier.issn0948-1907-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/137827-
dc.description.abstractA novel titanium precursor with extended air stability and volatility is demonstrated to facilitate an efficient incorporation of the titanium component for the MOCVD of BST films. In addition to the favourable stability and volatility characteristics, the new white crystalline complex [Ti(mpd)(mdop)(mu-OMe)](2) (Figure) has a thermal decomposition behavior comparable to those of the Ba and Sr precursors used for the deposition BST thin films from a cocktail of the three metal precursors in toluene.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectCHEMICAL-VAPOR-DEPOSITION-
dc.subjectSTRONTIUM-TITANATE FILMS-
dc.subjectDIRECT LIQUID INJECTION-
dc.subjectACCOMMODATION-
dc.subjectPRECURSORS-
dc.subjectVOLATILE-
dc.subject(BA-
dc.titleEfficient incorporation of the ti component with a novel titanium diolate complex in the CVD of Ba(1-x)SrxTiO(3) thin films-
dc.typeArticle-
dc.identifier.doi10.1002/cvde.200304161-
dc.description.journalClass1-
dc.identifier.bibliographicCitationCHEMICAL VAPOR DEPOSITION, v.10, no.2, pp.67 - +-
dc.citation.titleCHEMICAL VAPOR DEPOSITION-
dc.citation.volume10-
dc.citation.number2-
dc.citation.startPage67-
dc.citation.endPage+-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000220659800002-
dc.identifier.scopusid2-s2.0-1942487313-
dc.relation.journalWebOfScienceCategoryElectrochemistry-
dc.relation.journalWebOfScienceCategoryMaterials Science, Coatings & Films-
dc.relation.journalWebOfScienceCategoryPhysics, Condensed Matter-
dc.relation.journalResearchAreaElectrochemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICAL-VAPOR-DEPOSITION-
dc.subject.keywordPlusSTRONTIUM-TITANATE FILMS-
dc.subject.keywordPlusDIRECT LIQUID INJECTION-
dc.subject.keywordPlusACCOMMODATION-
dc.subject.keywordPlusPRECURSORS-
dc.subject.keywordPlusVOLATILE-
dc.subject.keywordPlus(BA-
dc.subject.keywordAuthorCVD(chemical vapor deposition)-
dc.subject.keywordAuthorTi precursor-
dc.subject.keywordAuthorthin film-
dc.subject.keywordAuthormetal-organic-
dc.subject.keywordAuthorBST film-
dc.subject.keywordAuthorTi component-
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