DSpace at KIST: Electrodeposition of copper on porous reticular cathode (Ⅰ)

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DC Field	Value	Language
dc.contributor.author	이관희	-
dc.contributor.author	이화영	-
dc.contributor.author	정원용	-
dc.date.accessioned	2024-01-21T13:39:25Z	-
dc.date.available	2024-01-21T13:39:25Z	-
dc.date.created	2022-01-10	-
dc.date.issued	2000-08	-
dc.identifier.issn	1229-1935	-
dc.identifier.uri	https://pubs.kist.re.kr/handle/201004/141187	-
dc.publisher	한국전기화학회	-
dc.title	Electrodeposition of copper on porous reticular cathode (Ⅰ) - Effect of cupric ion concentration	-
dc.title.alternative	다공성 그물구조 음극을 이용한 구리 전착에 관한 연구 (I) - 전해질 중의 구리 이온 농도의 영향	-
dc.type	Article	-
dc.description.journalClass	2	-
dc.identifier.bibliographicCitation	한국전기화학회지 = Journal of the Korean Electrochemical Society, v.3, no.3, pp.152 - 156	-
dc.citation.title	한국전기화학회지 = Journal of the Korean Electrochemical Society	-
dc.citation.volume	3	-
dc.citation.number	3	-
dc.citation.startPage	152	-
dc.citation.endPage	156	-
dc.subject.keywordAuthor	electrodeposition	-
dc.subject.keywordAuthor	copper	-
dc.subject.keywordAuthor	throwing power	-
dc.subject.keywordAuthor	porous reticular cathode	-

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