DSpace at KISTKIST Article2000

Full metadata record

DC Field Value Language
dc.contributor.authorKim, JM-
dc.contributor.authorChang, TE-
dc.contributor.authorPark, RH-
dc.contributor.authorKim, DJ-
dc.contributor.authorHan, DK-
dc.contributor.authorAhn, KD-
dc.date.accessioned2024-01-21T13:42:11Z-
dc.date.available2024-01-21T13:42:11Z-
dc.date.created2021-09-05-
dc.date.issued2000-07-05-
dc.identifier.issn0366-7022-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/141236-
dc.description.abstractPatterned color images in the polymer film have been prepared using photolabile protecting groups. Irradiation of a poly mer film with 360-nm UV through a photomask followed by chemisorption of organic dyes afforded patterned color images in the polymer film.-
dc.languageEnglish-
dc.publisherCHEMICAL SOC JAPAN-
dc.subjectCHEMICALLY AMPLIFIED RESISTS-
dc.titleGeneration of patterned color images in polymer film with photogenerated base-
dc.typeArticle-
dc.identifier.doi10.1246/cl.2000.712-
dc.description.journalClass1-
dc.identifier.bibliographicCitationCHEMISTRY LETTERS, no.7, pp.712 - 713-
dc.citation.titleCHEMISTRY LETTERS-
dc.citation.number7-
dc.citation.startPage712-
dc.citation.endPage713-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000088364100002-
dc.identifier.scopusid2-s2.0-0034339447-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalResearchAreaChemistry-
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICALLY AMPLIFIED RESISTS-
dc.subject.keywordAuthorpatterned color images-
dc.subject.keywordAuthorpolymer film-
dc.subject.keywordAuthorphotogenerated base-
dc.subject.keywordAuthororganic dyes-
Appears in Collections:
KIST Article > 2000
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Simple Item Record

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE