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dc.contributor.author배철휘-
dc.contributor.author이전국-
dc.contributor.author박동균-
dc.contributor.author정형진-
dc.date.accessioned2024-01-21T13:45:54Z-
dc.date.available2024-01-21T13:45:54Z-
dc.date.created2022-01-10-
dc.date.issued2000-06-
dc.identifier.issn1225-9381-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/141301-
dc.publisher한국요업학회-
dc.titleLow temperature processing of SrBi2Ta2O9 thin films-
dc.typeArticle-
dc.description.journalClass2-
dc.identifier.bibliographicCitationKorean Journal of Ceramics, v.6, no.2, pp.110 - 115-
dc.citation.titleKorean Journal of Ceramics-
dc.citation.volume6-
dc.citation.number2-
dc.citation.startPage110-
dc.citation.endPage115-
dc.subject.keywordAuthorferroelectric-
dc.subject.keywordAuthorthin film-
dc.subject.keywordAuthorlow temperature processing-
dc.subject.keywordAuthororientation control-
dc.subject.keywordAuthorSrBi2Ta2O9-
dc.subject.keywordAuthorSr content-
dc.subject.keywordAuthorpost-annealing pressure-
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KIST Article > 2000
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