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dc.contributor.authorKim, JM-
dc.contributor.authorChang, TE-
dc.contributor.authorKang, JH-
dc.contributor.authorPark, KH-
dc.contributor.authorHan, DK-
dc.contributor.authorAhn, KD-
dc.date.accessioned2024-01-21T14:38:03Z-
dc.date.available2024-01-21T14:38:03Z-
dc.date.created2021-09-04-
dc.date.issued2000-01-
dc.identifier.issn1433-7851-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/141712-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectCHEMICALLY AMPLIFIED RESISTS-
dc.subjectMICROLITHOGRAPHY-
dc.subjectAMPLIFICATION-
dc.subjectDEPROTECTION-
dc.subjectCOPOLYMERS-
dc.titlePhotoacid-induced fluorescence quenching: A new strategy for fluorescent imaging in polymer films-
dc.typeArticle-
dc.identifier.doi10.1002/(SICI)1521-3773(20000515)39:10<1780::AID-ANIE1780>3.0.CO;2-H-
dc.description.journalClass1-
dc.identifier.bibliographicCitationANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.39, no.10, pp.1780 - +-
dc.citation.titleANGEWANDTE CHEMIE-INTERNATIONAL EDITION-
dc.citation.volume39-
dc.citation.number10-
dc.citation.startPage1780-
dc.citation.endPage+-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid000087122900009-
dc.identifier.scopusid2-s2.0-0034658623-
dc.relation.journalWebOfScienceCategoryChemistry, Multidisciplinary-
dc.relation.journalResearchAreaChemistry-
dc.type.docTypeArticle-
dc.subject.keywordPlusCHEMICALLY AMPLIFIED RESISTS-
dc.subject.keywordPlusMICROLITHOGRAPHY-
dc.subject.keywordPlusAMPLIFICATION-
dc.subject.keywordPlusDEPROTECTION-
dc.subject.keywordPlusCOPOLYMERS-
dc.subject.keywordAuthorfluorescence-
dc.subject.keywordAuthorheterocycles-
dc.subject.keywordAuthorpolymers-
dc.subject.keywordAuthorthin films-
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KIST Article > 2000
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