Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | PARK YOUNG JOON | - |
| dc.date.accessioned | 2024-02-21T05:34:47Z | - |
| dc.date.available | 2024-02-21T05:34:47Z | - |
| dc.date.issued | 2001-10 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/149119 | - |
| dc.subject | Cu interconnects | - |
| dc.subject | electromigration | - |
| dc.subject | reliability | - |
| dc.title | 구리배선의 electromigration 신뢰성 | - |
| dc.type | Book | - |
| dc.citation.startPage | 14 | - |
| dc.citation.endPage | 25 | - |
| dc.relation.isPartOfSeries | 재료마당 | - |
- Appears in Collections:
- KIST Publication > 2001
- Files in This Item:
- 135731.pdf(276.4 kB)Download
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