Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Seong, Hanwool | - |
dc.contributor.author | Choi, Won-Young | - |
dc.contributor.author | Choi, Jongbum | - |
dc.contributor.author | Kim, Duck Ho | - |
dc.contributor.author | Park, Tae-Eon | - |
dc.contributor.author | Min, Byoung Chul | - |
dc.contributor.author | Choi, Heon-Jin | - |
dc.contributor.author | Han, Dong Soo | - |
dc.date.accessioned | 2024-09-30T06:00:13Z | - |
dc.date.available | 2024-09-30T06:00:13Z | - |
dc.date.created | 2024-09-25 | - |
dc.date.issued | 2024-12 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/150683 | - |
dc.description.abstract | The unique properties of ferrimagnets including easy detection of their dynamic and static states, strong resistance to external disturbances, and rapid dynamic characteristics, have made them attractive in the spintronics community. Our study focuses on the engineering of these magnetic properties of ferrimagnets, particularly employing a GdFeCo alloy, a prominent ferrimagnetic material, by utilizing magnetron sputtering. A series of GdFeCo films are fabricated by altering their thicknesses and working pressure during the sputtering process. Our experimental results reveal that these sputtering parameters significantly influence a Gd composition within the films, which in turn affects critical properties of ferrimagnets such as magnetic anisotropy, and magnetic moment compensation temperature. By precisely controlling these sputtering parameters, we successfully tailored the magnetic properties of the GdFeCo thin films with desired properties, offering new possibilities for the creation of sophisticated magnetic materials tailored to specific technological needs. | - |
dc.language | English | - |
dc.publisher | The Korean Physical Society | - |
dc.title | Magnetic properties of GdFeCo thin films tailored by sputtering conditions | - |
dc.type | Article | - |
dc.identifier.doi | 10.1016/j.cap.2024.09.006 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | Current Applied Physics, v.68, pp.131 - 137 | - |
dc.citation.title | Current Applied Physics | - |
dc.citation.volume | 68 | - |
dc.citation.startPage | 131 | - |
dc.citation.endPage | 137 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.description.journalRegisteredClass | kci | - |
dc.identifier.scopusid | 2-s2.0-85203642162 | - |
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