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dc.contributor.authorChoi, Hyung Jin-
dc.contributor.authorJung, Byung Ku-
dc.contributor.authorChoi, Young Kyun-
dc.contributor.authorHong, Yun-Kun-
dc.contributor.authorLee, Yong Min-
dc.contributor.authorPark, Taesung-
dc.contributor.authorJo, Hyunwoo-
dc.contributor.authorKang, Moon Sung-
dc.contributor.authorJang, Ho Seong-
dc.contributor.authorZhao, Tianshuo-
dc.contributor.authorOh, Soong Ju-
dc.date.accessioned2024-11-07T01:00:09Z-
dc.date.available2024-11-07T01:00:09Z-
dc.date.created2024-11-06-
dc.date.issued2024-11-
dc.identifier.issn1385-8947-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/150964-
dc.description.abstractIndium Arsenide (InAs) colloidal quantum dots (CQDs) are emerging candidates for infrared photodetector applications owing to their excellent optoelectronic properties and low toxicity. However, low electron mobility stemming from its unique surface chemistry hinders its practical application. Through comprehensive structural and chemical analyses, we optimized the one-step HCl treatment to achieve stoichiometric balance, a wellpassivated surface with low defect density, and an improved coupling effect by reducing the interparticle distance. Subsequently, a near infrared photodetector at a wavelength of 980 nm was fabricated with the modified InAs QDs in thin film transistor structure by all-solution process, showing remarkable electron mobility enhancement of up to 3.15 cm2/V center dot s. The thin film phototransistor exhibited excellent photoresponse with a responsivity of 5.45 x 103 A/W, external quantum efficiency of 6.90 x 105%, and a linear dynamic range of 50 dB. This achievement represents the highest responsivity observed in an InAs QD-based phototransistor device, demonstrating its potential for lead-free infrared (IR) region optoelectronic applications.-
dc.languageEnglish-
dc.publisherElsevier BV-
dc.titleHydrogen chloride treated InAs quantum dot thin film phototransistor for ultrahigh responsivity-
dc.typeArticle-
dc.identifier.doi10.1016/j.cej.2024.156191-
dc.description.journalClass1-
dc.identifier.bibliographicCitationChemical Engineering Journal, v.499-
dc.citation.titleChemical Engineering Journal-
dc.citation.volume499-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.identifier.wosid001336662500001-
dc.identifier.scopusid2-s2.0-85206132171-
dc.relation.journalWebOfScienceCategoryEngineering, Environmental-
dc.relation.journalWebOfScienceCategoryEngineering, Chemical-
dc.relation.journalResearchAreaEngineering-
dc.type.docTypeArticle-
dc.subject.keywordPlusTRANSISTORS-
dc.subject.keywordPlusNANOCRYSTALS-
dc.subject.keywordPlusMOBILITY-
dc.subject.keywordAuthorInAs quantum dot-
dc.subject.keywordAuthorLigand exchange-
dc.subject.keywordAuthorEtching-
dc.subject.keywordAuthorPhototransistor-
dc.subject.keywordAuthorElectron mobility-
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