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dc.contributor.author강구민-
dc.contributor.author한일기-
dc.contributor.author김춘근-
dc.contributor.author김영환-
dc.contributor.author고형덕-
dc.contributor.author권석준-
dc.date.accessioned2024-01-12T02:41:46Z-
dc.date.available2024-01-12T02:41:46Z-
dc.date.issued2023-11-28-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/76215-
dc.title특정 파장의 광원 및 반응성 가스를 이용하여 대상물의 표면을 평탄화하는 방법 및 장치-
dc.typePatent-
dc.date.registration2023-11-28-
dc.date.application2019-02-28-
dc.identifier.patentRegistrationNumberZL201910150264.8-
dc.identifier.patentApplicationNumber201910150264.8-
dc.publisher.countryCC-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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