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dc.contributor.authorLEE, JI YEONG-
dc.contributor.authorPark, Gi Hoon-
dc.contributor.authorKim, Yanghee-
dc.contributor.authorJang, Yun Jung-
dc.contributor.authorJeong, Young Woo-
dc.contributor.authorKim, Hae-Ryoung-
dc.date.accessioned2024-01-12T02:45:04Z-
dc.date.available2024-01-12T02:45:04Z-
dc.date.created2023-12-26-
dc.date.issued2023-09-13-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/76380-
dc.description.abstractAccurate imaging and compositional analysis have also been the key driving technological factor for advances in semiconductor, Li ion battery, display, thermoelectric devices, oxide semiconductors. Atom probe tomography (APT) has been developed to characterize nanoscale features of materials, which is a unique instrument for threedimensional analysis with atomic resolution. Herein, we introduce our various sample preparation method for APT in the large field applications for various shape, size, oxygen sensitive features, temperature sensitive features, extreme surface analysis. We have tried for development of more simple and reliable analysis process. A variety of equipment were used for sample preparation such as EDS, EBSD, PIPS, glove box, glove-bag, cryo-stage, SIMS, TEM, e-beam evaporation with APT.-
dc.publisherInternational Microscopy Congress-
dc.titleVarious sample preparation method for correlative analysis-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationThe 20th International Microscopy Congress (IMC20)-
dc.citation.titleThe 20th International Microscopy Congress (IMC20)-
dc.citation.conferencePlaceKO-
dc.citation.conferencePlace부산 BEXCO-
dc.citation.conferenceDate2023-09-10-
dc.relation.isPartOfThe 20th International Microscopy Congress (IMC20)-

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