Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Donghee | - |
dc.date.accessioned | 2024-01-12T03:32:24Z | - |
dc.date.available | 2024-01-12T03:32:24Z | - |
dc.date.created | 2022-11-30 | - |
dc.date.issued | 2022-02 | - |
dc.identifier.issn | 1229-120X | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/76790 | - |
dc.language | Korean | - |
dc.publisher | 한국공업화학회 | - |
dc.title | 저온 플라즈마 응용 연구 동향 | - |
dc.title.alternative | Trends in Low Temperature Plasma Applications | - |
dc.type | Article | - |
dc.description.journalClass | 2 | - |
dc.identifier.bibliographicCitation | 공업화학전망, v.25, no.1, pp.3 - 21 | - |
dc.citation.title | 공업화학전망 | - |
dc.citation.volume | 25 | - |
dc.citation.number | 1 | - |
dc.citation.startPage | 3 | - |
dc.citation.endPage | 21 | - |
dc.description.isOpenAccess | N | - |
dc.description.journalRegisteredClass | other | - |
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