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dc.contributor.authorKim, Jin Hee-
dc.contributor.authorHan, Jong Hun-
dc.contributor.authorWee, Jae-Hyung-
dc.contributor.authorChoi, Go Bong-
dc.contributor.authorHong, Seung ki-
dc.contributor.authorKim, Yoong Ahm-
dc.date.accessioned2024-01-12T03:33:11Z-
dc.date.available2024-01-12T03:33:11Z-
dc.date.created2023-01-19-
dc.date.issued2021-09-
dc.identifier.issn2673-3501-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/76823-
dc.description.abstractMultiple heteroatom-doped graphene is of great interest for developing an efficient electrocatalyst for oxygen reduction reaction (ORR). To maximize the electrocatalytic performance of doped graphene, the competitive doping mechanism caused by the different atomic sizes of dopants should be developed. Herein, three different heteroatoms (e.g., N, P and B) are competitively introduced into reduced graphene oxide (RGO) using both single- and two-step processes. The total quantity of heteroatoms for ternary RGO synthesized using the two-step process is lower than that when using the single-step process. Higher ORR electrocatalytic activity for the two-step-synthesized RGO compared to the single-step-synthesized RGO can be explained by: (a) a high amount of P atoms; (b) the fact that B doping itself decreases the less electrocatalytic N moieties such as pyrrole and pyridine and increases the high electrocatalytic moieties such as quaternary N; (c) a high amount of B atoms itself within the RGO act as an electrocatalytic active center for O2 adsorption; and (d) a small amount of substitutional B might increase the electrical conductivity of RGO. Our findings provide new insights into the design of heteroatom-doped carbon materials with excellent electrocatalytic performance.-
dc.languageEnglish-
dc.publisherMDPI AG-
dc.titleImportance of Doping Sequence in Multiple Heteroatom-Doped Reduced Graphene Oxide as Efficient Oxygen Reduction Reaction Electrocatalysts-
dc.typeArticle-
dc.identifier.doi10.3390/applnano2030019-
dc.description.journalClass1-
dc.identifier.bibliographicCitationApplied Nano, v.2, no.3, pp.267 - 277-
dc.citation.titleApplied Nano-
dc.citation.volume2-
dc.citation.number3-
dc.citation.startPage267-
dc.citation.endPage277-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassother-
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KIST Article > 2021
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