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dc.contributor.author최지원-
dc.contributor.author신태희-
dc.contributor.author송현철-
dc.contributor.author윤석진-
dc.date.accessioned2024-01-12T04:02:33Z-
dc.date.available2024-01-12T04:02:33Z-
dc.date.issued2013-08-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/77503-
dc.title알루미나 완충층을 포함하는 고밀도의 압전 후막 및 그 제조방법-
dc.typePatent-
dc.date.registration2013-08-29-
dc.date.application2011-11-28-
dc.identifier.patentRegistrationNumber1303924-
dc.identifier.patentApplicationNumber2011-0125270-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > Others
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