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dc.contributor.author이경일-
dc.contributor.author민병철-
dc.contributor.author신경호-
dc.date.accessioned2024-01-12T04:03:49Z-
dc.date.available2024-01-12T04:03:49Z-
dc.date.issued2017-04-05-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/77566-
dc.title산화막 제거방법과 이 방법에 사용된 스퍼터링장치, 산화막 제거방법을 이용한 전자소자의 제조방법 및 산화막 제거방법이 적용되어 형성된 전자소자-
dc.typePatent-
dc.date.registration2017-04-05-
dc.date.application2010-10-27-
dc.identifier.patentRegistrationNumber10-1725848-
dc.identifier.patentApplicationNumber10-2010-0105509-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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