Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 김태송 | - |
dc.contributor.author | 천채일 | - |
dc.contributor.author | 김용범 | - |
dc.date.accessioned | 2024-01-12T05:30:39Z | - |
dc.date.available | 2024-01-12T05:30:39Z | - |
dc.date.issued | 2004-02-19 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/78546 | - |
dc.title | 고밀도 압전 후막 및 그 제조 방법 | - |
dc.type | Patent | - |
dc.date.registration | 2004-02-19 | - |
dc.date.application | 2001-05-26 | - |
dc.identifier.patentRegistrationNumber | 0420929 | - |
dc.identifier.patentApplicationNumber | 2001-0029272 | - |
dc.publisher.country | KO | - |
dc.type.iprs | 특허 | - |
dc.contributor.assignee | 한국과학기술연구원 | - |
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