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dc.contributor.author김태송-
dc.contributor.author천채일-
dc.contributor.author김용범-
dc.date.accessioned2024-01-12T05:30:39Z-
dc.date.available2024-01-12T05:30:39Z-
dc.date.issued2004-02-19-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/78546-
dc.title고밀도 압전 후막 및 그 제조 방법-
dc.typePatent-
dc.date.registration2004-02-19-
dc.date.application2001-05-26-
dc.identifier.patentRegistrationNumber0420929-
dc.identifier.patentApplicationNumber2001-0029272-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2001
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