Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 조정 | - |
dc.contributor.author | 고석근 | - |
dc.date.accessioned | 2024-01-12T06:01:13Z | - |
dc.date.available | 2024-01-12T06:01:13Z | - |
dc.date.issued | 2002-07-08 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/79145 | - |
dc.title | 수소 이온보조 반응법을 이용한 고분자 표면처리 방법 | - |
dc.type | Patent | - |
dc.date.registration | 2002-07-08 | - |
dc.date.application | 1999-09-16 | - |
dc.identifier.patentRegistrationNumber | 345289 | - |
dc.identifier.patentApplicationNumber | 99-39876 | - |
dc.publisher.country | KO | - |
dc.type.iprs | 특허 | - |
dc.contributor.assignee | 한국과학기술연구원 | - |
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