DSpace at KISTKIST Patent2020

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dc.contributor.author김형석-
dc.contributor.author김형우-
dc.contributor.author장지혜-
dc.contributor.author이민아-
dc.contributor.author김상옥-
dc.contributor.author류승호-
dc.contributor.author임희대-
dc.contributor.author정경윤-
dc.date.accessioned2024-01-12T06:03:41Z-
dc.date.available2024-01-12T06:03:41Z-
dc.date.issued2022-02-03-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/79266-
dc.title폴리 도파민 표면 개질의 기여로 형성된 TiO2 나노층이 균일하게 코팅된 Ni-rich 층상 계 리튬이온전지 양극 소재 합성 및 평가-
dc.typePatent-
dc.date.registration2022-02-03-
dc.date.application2020-01-29-
dc.identifier.patentRegistrationNumber10-2359803-
dc.identifier.patentApplicationNumber10-2020-0010326-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2020
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