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dc.contributor.authorChung, In Jae-
dc.contributor.authorLee, Ju Hyeong-
dc.contributor.authorAhn, Cheol-Hee-
dc.contributor.authorKwon, Ick-
dc.contributor.authorKim, Kwangmeyung-
dc.date.accessioned2024-01-12T06:15:32Z-
dc.date.available2024-01-12T06:15:32Z-
dc.date.created2022-03-01-
dc.date.issued2016-08-20-
dc.identifier.issn0065-7727-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/79594-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.titleHypoxia-sensitive self-immolative dendrimer for fluorescent imaging-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitation252nd American Chemical Society National Meeting & Exposition-
dc.citation.title252nd American Chemical Society National Meeting & Exposition-
dc.citation.conferencePlaceUS-
dc.citation.conferenceDate2016-08-21-
dc.relation.isPartOfABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY-
dc.identifier.wosid000431460403436-
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KIST Conference Paper > 2016
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