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dc.contributor.author배완기-
dc.contributor.author조진한-
dc.contributor.author김희숙-
dc.contributor.author정승준-
dc.contributor.author조익준-
dc.date.accessioned2024-01-12T06:44:59Z-
dc.date.available2024-01-12T06:44:59Z-
dc.date.issued2017-10-31-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/80114-
dc.title리간드 치환반응 기반의 전하주입 조절 특성을 갖는 양자점 발광다이오드 소자-
dc.typePatent-
dc.date.registration2017-10-31-
dc.date.application2016-06-03-
dc.identifier.patentRegistrationNumber1794082-
dc.identifier.patentApplicationNumber2016-0069720-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2016
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