DSpace at KISTKIST Patent2006

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dc.contributor.author이승철-
dc.contributor.author안효신-
dc.contributor.author이광렬-
dc.date.accessioned2024-01-12T07:45:10Z-
dc.date.available2024-01-12T07:45:10Z-
dc.date.issued2008-08-06-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/81315-
dc.title전도성 질화물을 사이층으로 사용한 높은 스핀주입 효율을 갖는 다층막 구조 및 그 제조방법-
dc.typePatent-
dc.date.registration2008-08-06-
dc.date.application2006-12-15-
dc.identifier.patentRegistrationNumber0851891-
dc.identifier.patentApplicationNumber2006-0128886-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2006
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