Full metadata record
DC Field | Value | Language |
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dc.contributor.author | Cho, S.K. | - |
dc.contributor.author | Lee, J.K. | - |
dc.contributor.author | Kim, S.-K. | - |
dc.contributor.author | Kim, J.J. | - |
dc.date.accessioned | 2024-01-12T07:52:36Z | - |
dc.date.available | 2024-01-12T07:52:36Z | - |
dc.date.created | 2022-03-07 | - |
dc.date.issued | 2007-10 | - |
dc.identifier.issn | 1938-5862 | - |
dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/81419 | - |
dc.description.abstract | The addition of CuCN accelerated the deposition rate in cyanidebased Ag electroplating. The catalytic effect came from the highorder complexation of Cu with the free CN2- ions in electrolyte. It changed the equilibrium state of the electrolyte, presented as an increase in the amount of Ag(CN)2- compared to Ag(CN)32-. Because Ag(CN)2- could be reduced more easily, Ag electroplating was accelerated. FT-IR analysis showed the equilibrium change with the increase in Ag(CN)2- peak with CuCN addition. For superfilling, it is necessary to localise the complexation on Cu surface. ? The Electrochemical Society. | - |
dc.language | English | - |
dc.publisher | The Electrochemical Society | - |
dc.title | Acceleration effect of CuCN in Ag electrode position for metal interconnection | - |
dc.type | Conference | - |
dc.identifier.doi | 10.1149/1.2778387 | - |
dc.description.journalClass | 1 | - |
dc.identifier.bibliographicCitation | 5th International Symposium on ULSI Process Integration - 212th ECS Meeting, pp.297 - 304 | - |
dc.citation.title | 5th International Symposium on ULSI Process Integration - 212th ECS Meeting | - |
dc.citation.startPage | 297 | - |
dc.citation.endPage | 304 | - |
dc.citation.conferencePlace | US | - |
dc.citation.conferencePlace | Washington, DC | - |
dc.citation.conferenceDate | 2007-10-07 | - |
dc.relation.isPartOf | ECS Transactions | - |
dc.identifier.scopusid | 2-s2.0-45749138765 | - |
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