DSpace at KISTKIST Patent2015

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dc.contributor.author김수민-
dc.contributor.author김기강-
dc.contributor.author손장엽-
dc.contributor.author이승기-
dc.contributor.author이주송-
dc.date.accessioned2024-01-12T09:31:28Z-
dc.date.available2024-01-12T09:31:28Z-
dc.date.issued2016-12-05-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/83376-
dc.title기재 위에 h-BN 후막을 형성하는 방법 및 그로부터 제조된 h-BN 후막 적층체-
dc.typePatent-
dc.date.registration2016-12-05-
dc.date.application2015-03-27-
dc.identifier.patentRegistrationNumber10-1685100-
dc.identifier.patentApplicationNumber10-2015-0043309-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2015
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