DSpace at KISTKIST Patent2016

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dc.contributor.author김수민-
dc.contributor.author김기강-
dc.contributor.author손장엽-
dc.contributor.author이승기-
dc.contributor.author이주송-
dc.date.accessioned2024-01-12T09:31:31Z-
dc.date.available2024-01-12T09:31:31Z-
dc.date.issued2018-10-30-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/83378-
dc.title기재 위에 h-BN 후막을 형성하는 방법 및 그로부터 제조된 h-BN 후막 적층체-
dc.typePatent-
dc.date.registration2018-10-30-
dc.date.application2016-02-26-
dc.identifier.patentRegistrationNumber10,113,230-
dc.identifier.patentApplicationNumber15/055290-
dc.publisher.countryUS-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2016
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