DSpace at KISTKIST Conference PaperOthers

Full metadata record

DC Field Value Language
dc.contributor.authorKim, Yong Tae-
dc.date.accessioned2024-01-12T11:11:52Z-
dc.date.available2024-01-12T11:11:52Z-
dc.date.created2022-01-14-
dc.date.issued1997-07-01-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/85509-
dc.titleThermal stabilites of PECVD W-B-N thin films as a diffusion barrier-
dc.typeConference-
dc.description.journalClass1-
dc.identifier.bibliographicCitationMicroelectronic Manufacturing(SPIE-The International Society of Optical Eng. Austin Texas, 1-2 Oct.1997) Proc. of SPIE, pp.48 - 56-
dc.citation.titleMicroelectronic Manufacturing(SPIE-The International Society of Optical Eng. Austin Texas, 1-2 Oct.1997) Proc. of SPIE-
dc.citation.startPage48-
dc.citation.endPage56-
dc.relation.isPartOfMultilevel Interconnect Technology-
Appears in Collections:
KIST Conference Paper > Others
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML
Show Simple Item Record

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE