DSpace at KISTKIST Patent2014

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dc.contributor.author황승상-
dc.contributor.author홍순만-
dc.contributor.author이응찬-
dc.contributor.author구종민-
dc.contributor.author송선자-
dc.contributor.author백경열-
dc.date.accessioned2024-01-12T14:33:31Z-
dc.date.available2024-01-12T14:33:31Z-
dc.date.issued2016-02-19-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/89277-
dc.title저온에서 SiO2 박막성형이 가능한 코팅소재 제조 및 필름형성 방법-
dc.typePatent-
dc.date.registration2016-02-19-
dc.date.application2014-09-30-
dc.identifier.patentRegistrationNumber10-1597551-
dc.identifier.patentApplicationNumber2014-0131626-
dc.publisher.countryKO-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2014
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